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  <titleInfo>
    <title>Vacuum technology, thin films, and sputtering</title>
    <subTitle>an introduction</subTitle>
  </titleInfo>
  <name type="personal">
    <namePart>Stuart, R. V.</namePart>
    <role>
      <roleTerm authority="marcrelator" type="text">creator</roleTerm>
    </role>
  </name>
  <typeOfResource>text</typeOfResource>
  <originInfo>
    <place>
      <placeTerm type="text">New York</placeTerm>
    </place>
    <publisher>Academic Press</publisher>
    <dateIssued>1983</dateIssued>
    <issuance>monographic</issuance>
  </originInfo>
  <physicalDescription>
    <extent>viii, 151 p. : ill. ; 24 cm.</extent>
  </physicalDescription>
  <note type="statement of responsibility">R.V. Stuart.</note>
  <note>Includes index.</note>
  <subject authority="lcsh">
    <topic>Vacuum technology</topic>
    <topic>Chemical technology</topic>
  </subject>
  <subject authority="lcsh">
    <topic>Thin films</topic>
  </subject>
  <subject authority="lcsh">
    <topic>Cathode sputtering (Plating process)</topic>
  </subject>
  <classification authority="lcc">TP156.V3 S78 1983</classification>
  <classification authority="ddc" edition="19">621.5/5</classification>
  <identifier type="isbn">0126747806</identifier>
  <identifier type="lccn">82013748</identifier>
  <identifier type="uri">http://www.loc.gov/catdir/description/els032/82013748.html</identifier>
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