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  <titleInfo>
    <title>Etching of III-V semiconductors</title>
    <subTitle>an electrochemical approach</subTitle>
  </titleInfo>
  <titleInfo type="alternative">
    <title>Etching of 3-5 semiconductors</title>
  </titleInfo>
  <name type="personal">
    <namePart>Notten, P. H. L. (Peter H. L.)</namePart>
    <role>
      <roleTerm authority="marcrelator" type="text">creator</roleTerm>
    </role>
  </name>
  <name type="personal">
    <namePart>Meerakker, J. E. A. M. van den (Jan E. A. M.)</namePart>
  </name>
  <name type="personal">
    <namePart>Kelly, J. J. (John J.)</namePart>
  </name>
  <typeOfResource>text</typeOfResource>
  <originInfo>
    <place>
      <placeTerm type="text">Oxford, UK</placeTerm>
    </place>
    <place>
      <placeTerm type="text">New York, NY, USA</placeTerm>
    </place>
    <publisher>Elsevier Advanced Technology</publisher>
    <publisher>Distributed in the USA and Canada by Elsevier Science Pub. Co.</publisher>
    <dateIssued>c1991</dateIssued>
    <issuance>monographic</issuance>
  </originInfo>
  <physicalDescription>
    <extent>xiv, 349 p. : ill. ; 25 cm.</extent>
  </physicalDescription>
  <note type="statement of responsibility">P.H.L. Notten, J.E.A.M. van den Meerakker, J.J. Kelly.</note>
  <note>Includes bibliographical references and indexes.</note>
  <subject authority="lcsh">
    <topic>Semiconductors</topic>
    <topic>Etching</topic>
  </subject>
  <subject authority="lcsh">
    <topic>Electrochemistry</topic>
  </subject>
  <classification authority="lcc">TK7871.85 .N674 1990</classification>
  <classification authority="ddc" edition="20">621.381/52</classification>
  <identifier type="isbn">0946395845</identifier>
  <identifier type="lccn">90042266</identifier>
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