Materials for microlithography : radiation-sensitive polymers / L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984.

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Material type: Text

TextSeries: ACS symposium series ; 266Publication details: Washington, D.C. : The Society, c1984.Description: viii, 494 p. : ill. ; 24 cmISBN:

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Holdings
Item type	Current library	Call number	Copy number	Status	Barcode
Loan - Normal on open shelf	UOE Main Library Open shelf	TK7871.15.P6 M37 1984 (Browse shelf(Opens below))	10043689	Available	10043689
Loan - Normal on open shelf	UOE Main Library Open shelf	TK7871.15.P6 M37 1984 (Browse shelf(Opens below))	10043690	Available	10043690
Loan - Normal on open shelf	UOE Main Library Open shelf	TK7871.15.P6 M37 1984 (Browse shelf(Opens below))	10043688	Available	10043688
Loan - Normal on open shelf	UOE Main Library Open shelf	TK7871.15.P6 M37 1984 (Browse shelf(Opens below))	10043691	Available	10043691

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